FAST LOOPS
Figure 1. Such loops always must be installed in parallel to a pressure drop.
The fast loop must be placed in parallel with a pressure drop (∆P). Figure 1 shows some commonly used options.Having the fast loop in parallel with process equipment such as a control valve or heat exchanger usually minimizes operating and installation costs. However, it also creates a new flow path. This may change potential consequences of failures. It also may make more complex the procedures for equipment isolation while the unit is running. So, sometimes, placing the loop in parallel to operating equipment may not be a good choice.A better option in such cases may be to install a restriction orifice specifically to generate flow for the fast loop. Such a stand-alone package provides more flexibility in installation but the orifice will add pressure drop in the system that may increase energy costs or reduce unit capacity. If necessary, the orifice can be installed between flanges or welded-in if flanges are considered leak or contamination points.The configurations shown all assume simple single-phase sampling. If the system is two phase, getting a representative sample becomes much more complex. Isokinetic sampling (see: “
Don’t Be Fazed by Multiphase Sampling") is required to get the slipstream. Piping configurations must prevent phase separation from creating unrepresentative samples. The position and orientation of sampling nozzles also can significantly affect analyzer results (see: “
Properly Position Sampling Nozzles").Without good samples, controlling the process can be difficult and expensive mistakes can occur. While specifics of high-fidelity sampling systems vary with the process, accounting for sorption effects and using fast-loop systems can help ensure getting truly representative samples.
ANDREW SLOLEY is a Contributing Editor to Chemical Processing. You can e-mail him at
[email protected]